SICK Accessories: Reflectors and optics BEF-SLIT MASK-G2S

The BEF-SLIT MASK-G2S is a precision optical accessory designed to enhance the performance of sensor systems. It features a slit mask designed for use in specific optical applications, improving light direction, focusing, and detection accuracy. Ideal for systems requiring precise control of light or beam shaping, the BEF-SLIT MASK-G2S helps optimize the efficiency and performance of optical setups. Built for durability and long-term reliability, this accessory is perfect for a wide range of industrial, scientific, and sensor applications where precise optical management is essential.