SICK Accessories: Reflectors and optics BEF-SLIT MASK-G6

The BEF-SLIT MASK-G6 is a high-precision optical accessory designed to improve the performance of sensor systems by controlling light direction and beam shaping. With its slit mask design, it ensures accurate light management, making it ideal for applications that require precise optical control. The BEF-SLIT MASK-G6 enhances the efficiency and reliability of optical setups, providing consistent and optimal results. Built for durability and long-term use, this accessory is perfect for industrial, scientific, and sensor applications where light precision is critical for accurate measurements.